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NUANCE: Nanoscale Characterization Experimental Center

Heidelberg MLA150 Seminar

Fast and Large-area Maskless Photolithography

with Heidelberg MLA150

 Wednesday, January 24 th   | 12:00-1:00 pm (Lunch provided)

MSE conference room | Cook Hall 2058


Steffen Diez

CSO Heidelberg Instruments Mikrotechnik GmbH, Lead developer of the MLA150 System

Christian Bach

CEO Heidelberg Instruments Inc.

Niels Wijnaendts van Resandt

Director of Sales Heidelberg Instruments Inc.


Are you a photolithographer who need the flexibility of a direct-writing maskless aligner as well as the fast speed and the large-area exposure of a mask aligner? The Heidelberg MLA150 maskless aligner can meet your requirement. Exposing an area of 100 x 100 mm² with structures as small as 1 micron will take less than 10 minutes. Other key features of the MLA150 aligner are:

  • Dual laser 405 nm and 375 nm
  • Easy SU-8 exposure
  • Automatic labeling
  • Overview and high-resolution cameras

The representatives from Heidelberg Instruments will introduce the capabilities of the MLA150 maskless aligner which was recently ordered by NUFAB. Bring your questions about maskless photolithography and pattern design!

MLA 150 instrument and sample imagesheidelberg_logo.jpg