Vacuum Oven – YES
YES Vacuum Convection Oven can be used to cure polyimide films on only Silicon and quarts/glass substrates in an O2 and H2O free environment. Any other substrate or materials must be approved by the staff before use.
Instrument Details
Features
Temperature range |
20°C – 300°C |
Temperature Controller |
Single set point PID |
Atmosphere |
vacuum |
Maximum Substrate size |
400 mm |
Resolution |
±0.5 °C |
Max vacuum |
40 mTorr |
YES Vacuum Convection Oven

NUcore RESERVATION
Facility Contact
Main Contact: Anil Dhote, PhD
Office: Cook Hall, #4087
(847) 491-5959 / email
Alternate Contact: Scott Kreager
(847) 491-4497 / email
Location
Technological Institute FG70