Features
| Temperature range | 20°C – 300°C |
| Temperature Controller | Single set point PID |
| Atmosphere | vacuum |
| Maximum Substrate size | 400 mm |
| Resolution | ±0.5 °C |
| Max vacuum | 40 mTorr |
Vacuum Oven – YES
YES Vacuum Convection Oven can be used to cure polyimide films on only Silicon and quarts/glass substrates in an O2 and H2O free environment. Any other substrate or materials must be approved by the staff before use.
Instrument Details
YES Vacuum Convection Oven
