Features
- The PD-220NL is a loadlocked plasma enhanced chemical vapor deposition system capable of depositing silane based SiO2, Si3N4, and TEOS based SiO2.
- Substrate size up to 8” diameter wafers
- 13.56MHz and 400kHz RF generators for low, high, and mixed frequency depositions
- Easy touchscreen operation with process recipes that include substrate loading and unloading
- Gases: Silane, N2O, NH3, O2, H2, N2, Ar, C2F6, and TEOS (liquid precursor).
