Features
- Touch Screen Interface
- Up to 6 process chemicals
- Maximum substrate size: 8”
- Minimum substrate size: none
- Encoded spin motor for precise positioning and speed control
- Available Chucks: 4” and 5” mask plates, 3” and 4” wafers, and small piece
Automatic Develop System – Osiris UNIXX S 20 D
Osiris Unixx S 20D is an automated dry-in dry-out spin-developer station, which can be used to develop both positive and negative photoresists including SU8.
Instrument Details
Osiris UNIXX S 20 D
