Features
- Three 3″ diameter sputter guns in sputter up configuration
- Two 3″ and two 2″ diameter sputter guns in sputter up configuration (Sputter II)
- 4″ substrate holder with heater up to 850 C
- 6″ substrate holder with heater up to 400 C
- DC, Pulse, and RF Power Supplies
- Substrate rotation for +/- 2.5% film thickness uniformity
- Substrate bias
- Turbo pump backed by a dry roughing pump
