Features Substrate up to 4” Substrate heating to 300C for thermal ALD Pulsed precursor delivery ALD of dielectric films Precise control of films from the nano scale to the micro-scale. Conformal film growth
Facility ContactMain Contact: Anil Dhote, PhDOffice: Cook Hall, #4087847-491-5959 / email Alternate Contact: Diego Santiago De La Vega(847) 467-2015 / email