Features

• Broad, low-energy Ar+ ion beam milling. 

• Hybrid cross-section and flat milling capabilities. 

• Provides improved surface smoothness, beneficial for general SEM imaging as well as analytical techniques such as EDS, WDS, EBSD, and AFM. 

• Maximum cross-section milling rate of ~500 µm/h on Si

• 0.0 to 6.0 kV accelerating voltage.  

• Intermittent settings ranging from 1 sec to ~1 hour. 

Hitachi IM4000-II Ion Mill

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