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The EPIC-FIB facility houses two focused ion beam / scanning electron microscopes (FIB-SEM), each with its own specialized set of capabilities. These include conventional sample preparation for TEM and atom probe tomography (APT). FIB-SEM tomography, ion beam lithography, nanomanipulation, probing, in situ probing, EDS, EBSD, and a range of imaging modalities. In addition, both systems are equipped with gas injection systems for deposition (Pt, C, etc).

In addition to our state-of-the-art equipment, experienced staff members are on-hand to train and assist users with FIB-SEM work and sample preparation techniques.

FEI Helios Nanolab SEM / FIB

This dual-beam FIB-SEM enables simultaneous FIB milling and SEM imaging and is equipped with a STEM detector, Omniprobe AutoProbe 200 and Kleindiek nanomanipulation system. Capable of sub-nanometer SEM resolution at 15kV, <1.5nm at 1kV. The high current FIB column provides 5nm resolution at 30kV and low energy milling capabilities.

  • Five gas injection systems for etching / deposition
  • ibss Group's GV10x Downstream Plasma Asher
  • STEM detector
  • Raith ELPHY ion beam lithography (IBL) capabilities
  • Lift-out tools for TEM and Atom Probe Tomography (APT) samples
  • Vibration isolation table

Helios NanoLab




• High resolution SEM 1.6 nm at 1 kV
• High resolution FIB 4 nm at 30 kV
• Up to 90nA large ion probe current
• Vector scan system
• 3 deposition cartridges (C, W and Pt)
• Oxford Symmetry EBSD Detector
• Oxford Ultimax EDS detector
• In-situ lift-out system (Omniprobe 400)

JEOL 4700